ANSEROS SYSTEMS FOR SEMICONDUCTOR INDUSTRY

Over the last years, interest in ozone application in the semiconductor industry has increased. Its use in the cleaning process of wafers is well-established. Here, its ability to oxidize organic and metallic contaminants in the aqueous phase is utilized. New applications exploiting its ability to oxidize inorganics as well as organics in the solid phase are being investigated.

Anseros Industrial Ozone Solutions in the Semiconductor Industry (PDF)

 

Processes with ozone technology:

  • wet cleaning
  • TEOS
  • CVD
  • dry cleaning
  • hydrophobics

ANSEROS METAL-FREE OZONE GENERATORS & ANALYZERS

 METAL FREE OZONE GENERATORS

 

 

Anseros metal-free double walled ozone generators are available as different models depending on the volume and concentration required. The long time maintenance free operational capacity of Anseros metal-free ozone generators matches them with any hostile environment.

 

Please see the details about different models by downloading PDF documents.

COM-AD-01.pdf (German version)
COM-AD-01.pdf (English version)
COM-AD-02.pdf (German version)
COM-AD-02.pdf (English version)
COM-AD-04.pdf (German version)
COM-AD-04.pdf (English version)
COM-AD-08.pdf (German version)
COM-AD-08.pdf (English version)

 

 METAL-FREE OZONE ANALYZERS

 

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ND-UV-process photometer for continuous measurement of ozone in DI-water at high concentrations. Metal-free for highly purified applications, e.g. in the semiconductor industry.

WM.pdf (German version)

WM.pdf (English version)

 

 METAL-FREE CUBICLES (ANYLYZERS+GENERATORS)

 

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Rack-mounted systems are available as a combination of ozone generators along with analyzers.

Please contact Anseros R&D departement for further details.

 

ANSEROS METAL-FREE OZONE SYSTEMS FOR SEMICONDUCTOR PROCESSING

 SYSTEMS

 PAP-SC

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The Anseros PAP-SC (metal-free) is equipped with a flow-through system. This complete system is a robust tool in ultra pure water requirements. Easy plug-and-play installations and standard rack mount dimensions. The system consist of a CO2 dosage and diffusor sub-system as well as of an ozone dosage and ozone dispergator sub-system. Furthermore, continuous ozone monitoring capability and a process tank are included.

Please contact our R&D departement for further details.

 PAP-SC-4000

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Anseros PAP-SC-4000 (metal-free) - a fully automatic control system. Centralized PLC control panels for programmed operations, data acquisition and overall system monitoring. Basd on plug-and-play technology, the system runs smoothly and integrates with existing ultra-pure requirements. Built-in subsystems, e.g. an ozone reductor or process reactors, are assuredly maintenance free for smooth operation.

Please contact our R&D department for further details.

 

 CAT-HO-8000 (OZONE REDUCTOR)

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Semiconductor facilities use ozone for dry and wet cleaning processes. After use, the ozone must by destroyed to protect the enviroment. An ozone reductor based on a thermal heat exchanger is a perfect solution for such kinds of tasks. It is small in size, economic (low power consumption), maintenance-free, resistant against water vapour, acids and solvents, and, furthermore, suitable for all processes due to automatic control features.

CAT-HO-8000.pdf (German version)

CAT-HO-8000.pdf (English version)

 CAT-UVC1

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Ozone is widely used in semiconductor processing for wet cleaning. Ozonated water must be drained continuously or intermittedly. High ozone concentration can damage the drainage piping or emission can occur in working areas. This can cause severe health and safety problems. To avoid any danger to materials and humans, ozone must be destroyed completely.

CAT-UVC-1.pdf (German version)

CAT-UVC-1.pdf (English version)

 

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